Niobium target

Niobium sputtering target is an important raw material for preparing niobium and its alloy thin films. Niobium target materials are widely used in the field of photoelectric, such as liquid crystal flat panel display, optical lens, electronic imaging, information storage, solar cell and glass coating, as well as in corrosive environment such as shipbuilding and chemical industry.

The niobium sputtering target has high requirements on the internal grain size and surface roughness of the product, among which the axial grain size is required to be uniform, the grain size is 50~100μm, and the surface roughness is required to be Ra≤1.6μm.

When preparing the niobium tube billet, the inner, outer and two ends of the billet should be tightly coated with steel ladle sleeves. Generally, the material is welded and sealed, and then the niobium tube target is obtained by hot extrusion. The niobium tube target is obtained by pickling and heat treatment.

A better way is. In the process of melting crude niobium in the horizontal crystallize, due to the high vacuum of the horizontal crystallize, the superheat of the melt is higher, the liquid maintenance time of niobium metal is longer, and the gap impurities, low melting point metal impurities and high vapor pressure metal impurities in the metal niobium can be removed, so that the smelted niobium plate with high purity can be obtained, and the purity is ≥99.95%.

Fortu Tech can produce and process niobium targets according to customer requirements.