Fortu Tech is an ISO Certified Corporation located in China and specializes in manufacturing Pure Vanadium Target. We have more than 20 years of production experience. Our products are Conflict Free material.
| Common specifications | ||||||||
| Thickness inch | 0.15 | 0.2 | 0.25 | 0.3 | 0.35 | 0.4 | 0.45 | 0.5 |
| Thickness mm | 3.81 | 5.08 | 6.35 | 7.62 | 8.89 | 10.16 | 11.43 | 12.7 |
The CAS Number for Vanadium target is 7440-62-2.
Vanadium targets usually require a high purity (above 99.95%) to ensure good uniformity and performance of the film generated during sputtering. This high purity reduces the effect of impurities on the properties of the film material. Vanadium has good electrical conductivity, so it can conduct current well during sputtering. This makes vanadium targets more widely used in electronics and semiconductor manufacturing. The corrosion resistance of the vanadium delta target is very good, and vanadium delta target can resist the corrosion of acid and base solutions, especially in the environment of chloride, sulfuric acid, hydrochloric acid and so on.
Vanadium target has good stability in high temperature environment and is not easy to be oxidized or decomposed. This is essential for deposition of vanadium films at high temperatures. Vanadium target has high hardness and strength, can maintain its physical form during sputtering and is not susceptible to mechanical wear. This helps extend the service life of the target.
Vanadium targets are often used for sputtering to form vanadium films or vanadium-based alloy films. These films generally have good oxidation resistance, wear resistance and corrosion resistance, and are widely used in electronic, optical and protective coatings.
| Mechanical Properties of Vanadium | ||
| Ultimate Tensile Strength | Yield Strength | Elongation |
| 60 000 min, psi | 45 000 min, psi | 20% |
| 420 min, Mpa | 320 min, Mpa | 20% |
If you have inquiry or want to discuss your design with us, please write email to us.
We will reply your email within 24 hours.
| Cas No. of Vanadium Foil | 7440-62-2 |
| EINECS No.of Vanadium Foil | 231-171-1 |
| Density of Vanadium | 6.11 g/cm3 |
| Melting Point of Vanadium | 1917 ℃ |
| Boiling Point of Vanadium | 3421 ℃ |
| Water solubility of Vanadium | insoluble |
| UN Dangerous Goods number of Vanadium | 3289 |
| Atomic weight of Vanadium | 50.9415 |
Vanadium targets are used in semiconductor processes to manufacture a variety of functional films, such as electrode materials and contact layers. Due to its moderate electrical conductivity, vanadium is suitable for use in semiconductor chip manufacturing process. Vanadium targets are also used for sputtering optical films, which have excellent optical properties and corrosion resistance, and are suitable for optical devices such as lenses and filters. Vanadium targets are used in the manufacture of anti-corrosion coatings and wear-resistant coatings, especially in high-demand fields such as aerospace and machinery, which can extend the service life of equipment and tools.
In addition to Vanadium Target, we also produce Vanadium Tube & Pipe, Vanadium Sheet & Plate, Vanadium Ingot, Vanadium Pellets, Vanadium Rod&Bar, Vanadium Disc, Vanadium Foil, Vanadium Wire, Vanadium machined parts,Vanadium Additive.
Add: 399 Chunhe Road, Baoshan District, Shanghai, China, 200941
Tel: +86 21 56656030
Email: info@fortu-tech.com
