Ta10W Target

90% Tantalum 10% tungsten target materials are mainly used in physical vapor deposition (PVD) and sputtering coating technologies. Through the bombardment of high-energy particles on the surface of the target material, the tantalum tungsten alloy target material is deposited in the form of a thin film on the substrate, thereby endowing the substrate with special properties.

1. Semiconductors and Integrated Circuits: Ta10W sputtering targets can form high dielectric constant (High-k) films, which are used as the gate dielectric layer in advanced logic chips to replace traditional silicon dioxide and reduce leakage current.Ta-10W sputtering targets can generate barrier layers (Barrier Layer) in copper interconnects (Cu Interconnects), preventing copper from diffusing into silicon or dielectric layers and enhancing the reliability of chips.

2. Optical Coating: The high-temperature resistant optical coating produced by tantalum 10 tungsten sputtering targets is used in optical components such as laser mirrors and infrared windows, enhancing their resistance to thermal shock and oxidation. Tantalum 10 tungsten sputtering targets can also be used as X-ray diffraction targets and as anode targets for X-ray tubes, capable of withstanding high-energy electron bombardment.

3. Corrosion resistance and protective coating: The Ta10W sputtering target can deposit a Ta-10W film on the inner walls of reaction vessels and pipelines in chemical equipment, effectively resisting strong acids (such as sulfuric acid and hydrochloric acid) and high-temperature corrosion. In marine engineering, it is used for key components of ships or offshore platforms to prevent corrosion by seawater.

4. Aerospace and Military Industry: Tantalum-10 tungsten sputtering targets are used to apply tantalum-10 tungsten coatings on engine blades, enhancing the high-temperature oxidation resistance and wear resistance of turbine blades. Stealth materials, serving as the functional layer for absorbing waves or high-temperature stealth coatings.

5. New Energy and Nuclear Industry: First-wall materials for fusion reactors, serving as plasma-facing materials (PFM) in nuclear fusion devices, are designed to withstand the erosion of high-temperature plasma. The Ta10W delta target can be used to produce fuel cell coatings, which are applied to the bipolar plates of proton exchange membrane fuel cells (PEMFC) to enhance conductivity and corrosion resistance.

6. Medicine and Biotechnology: Surface Modification of Implants: Deposit a Ta-10W film on the surface of orthopedic or dental implants, combining biocompatibility and wear resistance.

In addition to Tantalum alloys Ta-10W Target, we also produce Tantalum alloys Ta-10W Wire, Tantalum alloys Ta-10W Strip, Tantalum alloys Ta-10W Sheet & Plate, Tantalum alloys Ta-10W Ingot, Tantalum alloys Ta-10W Pellets, Tantalum alloys Ta-10W Strip, Tantalum alloys Ta-10W Rod, Tantalum alloys Ta-10W Disc, Tantalum alloys Ta-10W Shield, Tantalum alloys Ta-10W machined parts, Tantalum alloys Ta-10W Additive.